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A software package called CPO has been developed that simulates the motion of charged particles in electromagnetic fields. More than 200 benchmark tests have established CPO as the gold standard in low-energy charged-particle optics. A spin-off company was formed to market CPO, [text removed for publication]
This case study describes the invention, development and subsequent commercial application of the floating low-energy ion gun (FLIG), a key enabling technology for high-resolution depth profiling, in particular of semiconductor devices. Following its invention at the University of Warwick, the FLIG was commercialised and now plays an important role in the semiconductor industry as a key analytical instrument. Intel and its competitors have used the FLIG in developing specific technologies, such as the PentiumTM, XeonfTM and CoreTM i7 processors. Its impact extends beyond the electronics industry to consumers worldwide since the FLIG has played a key role in the development of multicore processors for personal computers, intense low-energy lighting for automotive and civil engineering, mobile telecommunications technology, and many other areas of advanced electronic, and other material, technologies. This invention has also led directly to an ISO standard for depth resolution.
DualEELS™ is a recent advance in Electron Energy Loss Spectroscopy (EELS) made possible by a successful collaboration between the University of Glasgow and Gatan, the world leader in electron spectroscopy systems for electron microscopy. The resulting Gatan GIF QUANTUM® and the ENFINIUM® electron microscope products, incorporating the novel DualEELS™ concept pioneered in Glasgow, have been a commercial success. Between the launch in 2009 and the end of 2011, 145 systems have been delivered to universities, research institutes and industry at a total market value of over US$7.5M. The market penetration of the DualEELS™ technique has been very high. In 2012, DualEELS™ units were delivered with over 70% of all GIF/EELS systems sold. These systems are used routinely for R&D, quality control and failure analysis in firms such as AMD, Intel and Samsung, and for development of the advanced materials and devices key to modern society in a wide range of industrial sectors.
The microscopy facilities in the Biomedical Sciences Research Institute of the University of Ulster have been vastly improved through our collaboration with FEI, the largest European EM manufacturer, which has led them to manufacture a cryostage dual-beam instrument of our design with unique capabilities, and to set up their European reference laboratory here. This has generated two further sets of impacts: collaboration and consultancy with various firms wishing to use our advanced imaging facilities, and advice to national, EU and global bodies on the novel cytotoxic hazards of nanoparticles, a major but optically invisible by-product of modern industry, and consequent public health risks.
Researchers within the Department of Physics and Astronomy at UCL have investigated the properties of defects in bulk HfO2 and at Si/SiOx/HfO2 interfaces. Results have been used by an industrial partner, SEMATECH (SMT), to improve the quality and reliability of high-performance microelectronic devices based on transistors. This has helped SMT to meet project objectives on behalf of member companies such as Intel and IBM, and UCL research results have been consistently highly evaluated by these companies. Recommendations made by SMT have been implemented by industrial partners in their currently manufactured devices, such as the 22nm process technology released by Intel in 2011.
Carrier mobility is a key parameter for the semiconductor industry, but its measurement is characterised by poor accuracy and unreliability for advanced transistors. The Microelectronics Research Group (RG1), working with the Logic Devices Consortium at IMEC (Inter-University Microelectronics Research Centre in Leuven, Belgium), developed a new technique that overcomes these problems, implemented it on industrial-standard equipment provided by Keithley Instruments (a US company based in Cleveland, Ohio), and prepared the application notes and software. This benefits test engineers in the semiconductor industry through significant improvement in the accuracy, reliability, cost, and efficiency of measurements. Keithley is disseminating information to its global customer base and is highlighting it as strength of its instruments in the promotion.
An advanced plasma source based on novel engineering has been developed and proven in conjunction with Thin Film Solutions Ltd (TFSL). This source is retrofittable to existing electron- beam deposition systems and significantly improves the properties of thin films and advanced optical filters. TFSL has produced commercial products based on this source and has achieved sales to date of £2.3 million (letter from CEO of TFSL provided) as the new technology has been widely adopted in the optical filter industry.
The Surrey Ion Beam Centre (based at the University of Surrey) pioneered the field of ion beam applications and is regarded as world leading, having initiated a significant number of high profile research activities for which it received recognition through the Queen's Anniversary prize in 2002. It works actively with industry, developing bespoke processes and services, particularly for the photonics industry, ultimately generating millions of pounds for the UK economy. It also serves as a European Centre for doctoral training.
Our research on semiconductor materials and devices has led to the establishment by e2v Technologies of a combined manufacturing, research and development facility within the School of Physics and Astronomy. We have adapted and transferred device simulation software to e2v, and have provided epitaxially-grown semiconductors and access to fabrication facilities which have been used in their manufacturing processes. Devices fabricated within the facility, which was opened in 2011, have generated sales of £7M for e2v. This initiative has also led to shifts in the investment priorities of e2v, and mitigated risks to the company arising from import restrictions associated with the US International Traffic in Arms Regulations (ITAR).
Research in the Microelectronics Group of the Cavendish Laboratory in the area of single-electron nanoelectronics, quantum computing and spintronics has been exploited by Hitachi, one of world's leading microelectronics companies. Research breakthroughs made in the Cavendish have defined Hitachi's R&D directions in quantum computing and spintronics, led to several Hitachi product developments and influenced senior Hitachi strategic decision makers regarding the future of computing.